Edwards STPXA3203C高真空分子泵

Edwards STP-XA3203C Turbomolecular Vacuum Pump - NEW

The STP-XA3203C turbo pump offers high performance in the process range of high vacuum to 2,300 sccm process flow with enhanced throughput for all gases.

This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition.

The outstanding performance is suited to both light and harsh applications, such as semiconductor etch, implant, lithography and LCD processes.

Advanced Rotor Design

• Increased H2, N2 and Ar performance
• Improved performance in the process pressure range of high vacuum to 2,300 sccm
• Maintenance free

5-Axis Magnetic Suspension System

• Zero contamination
• Low vibration

Innovative Torque Management

• Patented torque reduction mechanism

Optimized Temperature Management

• High temperature TMS capability
• Low deposition
• Built-in cooling mechanism
• Higher gas throughput heated and unheated
• Optimized life
• Harsh process compatible

Certifications

• SEMI® compliant, CE Marked and UL Listed

• Inlet flange	ISO-320F
  Pumping speed
  N2	3,200 l/s
  H2	2,300 l/s
  Compression ratio
  N2	> 108
  H2	> 6 x 103
  Ult. pressure	10-7 Pa
  Max. allowable backing pressure	266 Pa
  Max. allowable gas flow
  N2 (water cooled)	2,300 sccm (3.8 Pam3s-1)
  Ar (water cooled)	1,900 sccm (3.2 Pam3s-1)
  Rated speed	27,500 rpm
  Starting time	< 8 min
  Mounting position	Any
  Water cooling
  Flow	3 l/min-1
  Pressure	0.3 MPa
  Temperature	5 - 25°C
  Recommended purge gas flow	50 sccm
  Power consumption	1.5 kVA
  Input voltage	200 to 240 VAC
  Pump weight	80 kg

  Edwards STP-XA3203C Turbomolecular Vacuum Pump - NEW
  
  P/N YT66-0Z-050 / YT660Z050  STP-XA3203C  ISO-320F
  P/N PT66-0Z-080 / PT660Z080  STP-XA3203C  DN 320 CF
  P/N YT66-0Z-150 / YT660Z150  STP-XA3203C  VG-300

  
  

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